Work

Role of a cyclopentadienyl ligand in Hf precursors using H2O or O3 as oxidant in atomic layer deposition

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0004358

Authors: Youngmin Song, Hui-Jin Kim, Soo Hyun Lee, Sujin Kwon, Bonggeun Shong, Il-Kwon Oh

Institutions: Ajou University, Hongik University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Trade, Industry and Energy, Ministry of Science and ICT, South Korea

Awards: G4885389503, G5411463003, G8056665365, G8098453081

OpenAlex ID: W4408164258

FWCI: 0.228

Cites: 36

Cited by: 1

Related to: 10