Work

Simulation Study on the Effect of Temperature on PD Inside Void Defect Under the Closed Condition

Year: 2025

Type: article

Source: IEEE Transactions on Plasma Science

DOI: 10.1109/tps.2025.3539359

Authors: Quanfu Zheng, Zhaoqi Zhang, Lingen Luo, Gehao Sheng, Xiuchen Jiang

Institution: Shanghai Jiao Tong University

Language: English

Topic: High voltage insulation and dielectric phenomena

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: National Key Research and Development Program of China

Award: G7207082368

OpenAlex ID: W4408183079

FWCI: 0.424

Cites: 23

Cited by: 2

Related to: 10