Work

One-Pot Fabrication of Silicon Carbide Thin Films via Plasma-Enhanced Chemical Vapor Deposition (PECVD) Followed by In Situ Pyrolysis

Year: 2025

Type: article

Source: Industrial & Engineering Chemistry Research

DOI: 10.1021/acs.iecr.4c03786

Authors: Farnaz Tabarkhoon, Mohammad Bazmi, Nicholas A. Welchert, Theodore T. Tsotsis, Malancha Gupta

Institution: University of Southern California

Language: English

Topic: Silicon Carbide Semiconductor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Division of Civil, Mechanical and Manufacturing Innovation

Award: G1977848068

OpenAlex ID: W4408184297

FWCI: 1.386

Cites: 52

Cited by: 6

Related to: 10