Work

Synthesis and Characterizations of a Nonalkyl Tin Oxo Cluster and its Application as High EUV Absorption Coefficient and Etch Resistant Inorganic Resist for EUV Lithography

Year: 2025

Type: article

Source: Inorganic Chemistry

DOI: 10.1021/acs.inorgchem.5c00495

Authors: Hyeok Yun, Soyeong Heo, Jiyoung Bang, Minyeob Kim, Hyung-Bae Moon, Siwoo Noh, Geonhwa Kim, Hee-Seon Lee, Kyuyoung Heo, Sangsul Lee, Ki-Jeong Kim, Cheol-Min Kim, Hyun-Dam Jeong

Institutions: Chonnam National University, Pohang University of Science and Technology, Pohang Accelerator Laboratory, Korea Research Institute of Chemical Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Trade, Industry and Energy, National Research Foundation of Korea

Awards: G3649483509, G8116061442

OpenAlex ID: W4408203255

FWCI: 4.553

Cites: 98

Cited by: 20

Related to: 10