Work

Performance Optimization of Sulfonium-Functionalized Molecular Resists for EUV and Electron Beam Lithography

Year: 2025

Type: article

Source: ACS Applied Electronic Materials

DOI: 10.1021/acsaelm.5c00273

Authors: Zhuoran Liu, Jinping Chen, Tianjun Yu, Yi Zeng, Xudong Guo, Shuangqing Wang, Rui Hu, Michaela Vockenhuber, Peng Tian, Dimitrios Kazazis, Yasin Ekinci, Guoqiang Yang, Yi Li

Institutions: Chinese Academy of Sciences, Technical Institute of Physics and Chemistry, University of Chinese Academy of Sciences, Institute of Chemistry, Paul Scherrer Institute

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Chinese Academy of Sciences

Awards: G6004853180, G7368391619, G7763021201

OpenAlex ID: W4408213358

FWCI: 1.847

Cites: 56

Cited by: 8

Related to: 10