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Scan Speed Optimization for Wafer Exposure Time Reduction in Semiconductor Manufacturing

Year: 2024

Type: conference-paper

Source: Proceedings of the Annual Conference of the IEEE Industrial Electronics Society

DOI: 10.1109/iecon55916.2024.10905733

Authors: Jisu Kim, Hyeseon Kwon, Kwanghyun Cho, Myungsik Lee, Weonchan Sung, Yunha Kim, Jeong-Gil Kim

Institutions: Samsung (South Korea), Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4408281842

FWCI: 0.779

Cites: 7

Cited by: 1

Related to: 10