Research on the current research status and future development trend of extreme ultraviolet
Year: 2025
Type: article
Abstract: Extreme Ultraviolet (EUV) lithography is pivotal in semiconductor manufacturing and attosecond metrology. This paper delves into the current research status and future development trends of EUV, aiming to offer a comprehensive understanding and predictions for this technologys evolution. Considering the challenges in applying EUV in chip manufacture, we will discuss advanced methods such as metalenses, phase-shifting masks, EUV transient grating spectroscopy, and negative tone development (NTD) processes to address issues in photolithography. Additionally, this article employs a methodical literature review and analysis. Presently, EUV lithography machines with a numerical aperture (NA) of 0.33 have achieved mass production of 5nm logic chips. Nevertheless, generating a more stable EUV light source and enhancing the focusing ability and power of the light source remain critical challenges requiring resolution.
Author: Zixuan Yao
Institution: Hubei University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: hybrid
OpenAlex ID: W4408312805