Work

Prototyping of Si and III–V Compounds by Plasma Chemistry Using Dry Film Photoresist Mask

Year: 2025

Type: article

Source: Contributions to Plasma Physics

DOI: 10.1002/ctpp.202400050

Authors: Etienne Herth, David Bouville, Samson Edmond

Institutions: Centre National de la Recherche Scientifique, Université Paris-Saclay, Centre de Nanosciences et de Nanotechnologies

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4408323950

FWCI:

Cites: 51

Cited by:

Related to: 10