Work

Stress Compensation Effect in AlN/Mo/AlN/Polysilicon Stack for MEMS Application

Year: 2024

Type: conference-paper

Source: IEEE Electronics Packaging Technology Conference (EPTC)

DOI: 10.1109/eptc62800.2024.10909840

Authors: Jaibir Sharma, Zhang Qing Xin

Institutions: Agency for Science, Technology and Research, Institute of Microelectronics

Language: English

Topic: Advanced MEMS and NEMS Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4408325335

FWCI:

Cites: 9

Cited by:

Related to: 10