Strain- and dipole-induced interface states in gate-all-around transistors: Properties and implications for application
Year: 2025
Type: article
Source: Physical Review Applied
Institutions: Institute of Semiconductors, Peking University, Beihang University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4408330178
