Exceptional Resistance to Chlorine-Induced Photocatalytic Poisoning via Vacuum UV Irradiation
Year: 2025
Type: article
Authors: Shengjun Ye, Tao Ban, Zhenpan Zhang, Biyuan Liu, Ruijie Xie, Xinguo Ye, Ying Zhong, Jianping Cao, Lu Huang, Haibao Huang
Language: English
Field: Energy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4408359603
