Work

Extended model for chemically amplified resist with multiple photoacid generators

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0004381

Authors: Delong Yao, Lisong Dong, Yunyun Hao, Yayi Wei, Ming Fang

Institutions: Chinese Academy of Sciences, Institute of Microelectronics, University of Chinese Academy of Sciences, Shanghai Zhangjiang Laboratory, Zhangjiang Laboratory

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Awards: G2556365996, G3119880323

OpenAlex ID: W4408527416

FWCI:

Cites: 29

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Related to: 10