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High-power remote plasma source with alternative gas COF 2 for PECVD chamber dry cleaning

Year: 2025

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.35848/1347-4065/adc1d6

Authors: Ah Hyun Park, Hyuck Byun, Sang Jeen Hong

Institution: Myongji University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDGs: Responsible consumption and production, Climate action

Open Access status: closed

OpenAlex ID: W4408557039

FWCI: 1.386

Cites: 29

Cited by: 6

Related to: 10