Work

200Gb/s PAM4 oxide VCSEL development progress at Broadcom

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3041371

Authors: Jingyi Wang, M. V. Ramana Murty, Sizhu Jiang, David W. Dolfi, T. K. K. Wang, Zheng-Wen Feng, Sumtro-Joyo Taslim, Aadi Sridhara, Xinle Cai, Yu Rong Nelvin Leong, Gim-Hong Koh, Jason Chu, Laura M. Giovane

Institutions: Broadcom (United States), Broadcom (Singapore)

Language: English

Topic: Semiconductor Lasers and Optical Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4408601639

FWCI: 27.51

Cites: 7

Cited by: 12

Related to: 10