Work

TiN and TaN cointegration for 300 mm superconducting back end of line

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0004316

Authors: T. Chêne, R. Segaud, F. Nemouchi, P. Gergaud, S. Minoret, F. Gustavo, J. Garrione, T. Chevolleau

Institutions: Commissariat à l'Énergie Atomique et aux Énergies Alternatives, CEA Grenoble, Laboratoire d'Électronique des Technologies de l'Information, Université Grenoble Alpes, Institut polytechnique de Grenoble, Institut de Recherche Interdisciplinaire de Grenoble

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4408620784

FWCI: 0.227

Cites: 27

Cited by: 1

Related to: 10