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Nonchemically‐Amplified Molecular Resists Based on Calixarene Derivatives Enabling 14 nm Half‐Pitch Nanolithography

Year: 2025

Type: article

Source: Chinese Journal of Chemistry

DOI: 10.1002/cjoc.202500041

Authors: Rongrong Peng, Jinping Chen, Tianjun Yu, Yi Zeng, Shuangqing Wang, Xudong Guo, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Jun Zhao, Yanqin Wu, Yasin Ekinci, Guoqiang Yang, Yi Li

Institutions: Chinese Academy of Sciences, Technical Institute of Physics and Chemistry, University of Chinese Academy of Sciences, Institute of Chemistry, Paul Scherrer Institute, Shanghai Synchrotron Radiation Facility

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Awards: G6004853180, G7368391619, G7763021201

OpenAlex ID: W4408647779

FWCI: 3.233

Cites: 63

Cited by: 14

Related to: 10