Work

Perspective: Atomic Layer Deposition Strategies for Surface Passivation of Metal-Halide Perovskite Absorbers

Year: 2025

Type: article

Abstract: Recent advancements have been made in perovskite solar cells (PSCs) using atomic layer deposition (ALD) of aluminum oxide (Al2O3) and other suitable metal oxides such as zirconium oxide (ZrO2) as a perovskite surface passivation technique. ALD has demonstrated significant potential for enhancing photovoltaic (PV) performance and the long-term light, thermal, humidity, and ultraviolet (UV) stability of PSCs by addressing surface defects leading to higher charge extraction and mitigating environmental degradation with only a few nanometers of thickness. However, direct ALD deposition on perovskite films can sometimes degrade the perovskite film from ALD precursor reactivity, elevated temperatures, and vacuum-induced instabilities. This perspective discusses recent strategies, challenges, and future directions for surface passivation of the perovskite solar absorber using ALD to improve device performance and long-term stability for commercialization of PSCs.

Source: Electronic Materials Letters

DOI: 10.1007/s13391-025-00563-x

Authors: George Kwesi Asare, Joshua Sraku Adu, Byungha Shin, David J. Fermin, Helen Hejin Park

Institutions: Korea Research Institute of Chemical Technology, Korea University of Science and Technology, Korea Advanced Institute of Science and Technology, University of Bristol

Language: English

Topic: Perovskite Materials and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Affordable and clean energy

Open Access status: hybrid

Estimated APC paid: $3,490