Work

Impedance monitoring of a plasma chamber under plasma-off conditions for contamination control

Year: 2025

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.35848/1347-4065/adc461

Authors: Hwang Gyu Kim, Sang Jeen Hong

Institution: Myongji University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4408788789

FWCI: 0.231

Cites: 18

Cited by: 1

Related to: 10