Comparison and Sustainability Enhancement of Oxide Coatings by Reactive and Non-Reactive Radio Frequency Magnetron Sputtering Technique
Year: 2025
Type: article
Abstract: Technological advancements and changing global needs drive deposition techniques, widely used for altering surface properties of components. The crosswinds from global technological advancements in the mobility and power sectors have piqued the interest in sustainable renewable energy tapping devices. Thin aluminium oxide (Al2O3) films are highly valued for various applications in the manufacturing industry, such as cutting tool coatings, optics, energy, and microelectronics. A novel and facile approach has been adopted in the present work to fabricate an oxide-based thin film on a BK7 glass substrate. The aluminium oxide film is deposited by reactive radio frequency (RF) magnetron sputtering by impinging adequate argon to oxygen ratio in a high vacuum environment. Furthermore, Al2O3 is deposited by an alumina target with the same deposition technique, and the results were compared. A digital thickness monitor (DTM) is used to assess the thickness of the deposited film for both processes. The films were first characterized by X-ray diffraction and then analysed by other characterization methods, including Scanning Electron Microscopy, Atomic Force Microscopy, Tribometer and Nanoindentation, and UV-visible spectroscopy. The results indicated that Al2O3 deposited by reactive RF magnetron sputtering performed better in terms of surface morphology, UV-absorbance, nanohardness, and wear resistance and is therefore, more reliable and sustainable when compared with non-reactive RF magnetron sputtering.
DOI: 10.4028/p-nkju7d
Authors: Rishabh Raj Srivastava, Sudarsan Ghosh, Paruchuri Venkateswara Rao
Institution: Indian Institute of Technology Delhi
Language: English
Subfield: Mechanics of Materials
Field: Engineering
Domain: Physical Sciences
Open Access status: hybrid
OpenAlex ID: W4408844455