Work

Extending the working distance in near-field lithography with a two-material topological photonic crystal

Year: 2025

Type: article

Source: Applied Optics

DOI: 10.1364/ao.555776

Authors: Wenpeng Zhang, Yuanpeng Zhou, Hanyun Xue, Gaofeng Liang

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Awards: G232977736, G3196290693, G8165229243

OpenAlex ID: W4408906133

FWCI:

Cites: 44

Cited by:

Related to: 10