Buried Interfacial Engineering with Potassium Hypophosphite to Suppress Ion Migration for Improved and Stabilized Perovskite Photodetectors
Year: 2025
Type: article
Source: ACS Applied Electronic Materials
Authors: Jianxiang Huang, Huimin Zhang, Huiying Zhu, Chenglin Zhang, Mingming Chen, Dawei Cao
Institution: Jiangsu University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Award: G4192956769
OpenAlex ID: W4408973507
