Work

Ultrathin tantalum films for Schottky contacts on 4H silicon carbide

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0004313

Authors: Renato M. Beraldo, Rodrigo R. César, Melissa Mederos, Jacilene M. Medeiros, Andrei Alaferdov, Érick A. Santos, Ednan Joanni, Thebano E. A. Santos, Ricardo C. Teixeira, Marcos V. Puydinger dos Santos, Renato A. Minamisawa, José Alexandre Diniz

Institutions: Universidade Estadual de Campinas (UNICAMP), Brazilian Synchrotron Light Laboratory, Brazilian Center for Research in Energy and Materials, Centro de Tecnologia da Informação Renato Archer, FHNW University of Applied Sciences and Arts Northwestern Switzerland

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409117198

FWCI: 0.385

Cites: 32

Cited by: 1

Related to: 10