Work

Design of a grazing incidence illumination system for anamorphic extreme ultraviolet lithography

Year: 2025

Type: article

Source: Applied Optics

DOI: 10.1364/ao.557104

Authors: Yuqing Chen, Tong Li, Yanqiu Li, Lihui Liu

Institution: Beijing Institute of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, National Science and Technology Major Project

Awards: G1868669931, G2214122415

OpenAlex ID: W4409143537

FWCI:

Cites: 21

Cited by:

Related to: 10