Work

Proximity effect correction in lithography using a U-net neural network

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3058119

Authors: Kim Yumi, Hyoseok Park, Yeonsang Park

Institution: Chungnam National University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4409158039

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