End-to-end learned diffractive imaging system lithography adaptation design using hierarchical-dynamic simulation
Year: 2025
Type: article
Source: Optics Letters
DOI: 10.1364/ol.557427
Authors: Xuzhe Zhong, Hongyuan Wang, Ziyang Liu, Qiaohao Ning, Zijian Wang, Tengyu Li, Zhiqiang Yan
Language: English
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409170522