Work

Protocol for fabricating optically transparent, pinhole-free NiO thin film for memory devices using the spin-coating technique

Year: 2025

Type: article

Abstract: Fabricating visibly transparent and uniform metal oxide thin films is a significant challenge. Here, we present a protocol for the fabrication of NiO thin films. We detail the essential steps for substrate preparation. We then describe the optimized steps for spin coating, considering various parameters such as the concentration of the precursor solution, drying temperature, annealing temperature, and spin-coating speed. • Instructions for preparing the precursor solution for subsequent deposition • Step-by-step protocol to spin coat NiO thin film • Protocol facilitates the deposition of film of a thickness of ∼110 nm Publisher’s note: Undertaking any experimental protocol requires adherence to local institutional guidelines for laboratory safety and ethics. Fabricating visibly transparent and uniform metal oxide thin films is a significant challenge. Here, we present a protocol for the fabrication of NiO thin films. We detail the essential steps for substrate preparation. We then describe the optimized steps for spin coating, considering various parameters such as the concentration of the precursor solution, drying temperature, annealing temperature, and spin-coating speed.

Source: STAR Protocols

DOI: 10.1016/j.xpro.2025.103732

Authors: Adiba Adiba, Franco Mayanglambam, Tufail Ahmad

Institutions: Aligarh Muslim University, Indian Institute of Technology Guwahati

Language: English

Topic: Advanced Materials and Semiconductor Technologies

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $1,550

Funder: Council of Scientific and Industrial Research, India