Growth of Hexagonal Bn Crystals by Traveling-Solvent Floating Zone
Year: 2025
Type: article
Abstract: Large, high-purity single-crystals of hexagonal BN (h-BN) are essential for exploiting its many desirable and interesting properties. Here, we demonstrate via X-ray tomography, X-ray diffraction and scanning electron microscopy that h-BN crystals can be grown by traveling-solvent floating-zone (TSFZ). The diameters of grown boules range from 3 – 5 mm with lengths from 2 – 7 mm. Tomography indicates variable grain sizes within the boules, with the largest having areas of ≈ 1 mm × 2 mm and thickness ≈ 0.5 mm. Although the boules contain macroscale flux inclusions, the h-BN lattice itself is of high quality for samples grown under optimized conditions. The currently optimized growth procedure employs an Fe flux, moderate N2 pressure (PN2 ≈ 6 bar), and a growth rate of 0.1 mm/h. Raman spectroscopy for an optimized sample gives an average linewidth of 7.7(2) cm−1 for the E2g intralayer mode at 1365.46(4) cm−1 and 1.0(1) cm−1 for the E2g interlayer shear mode at 51.78(9) cm−1. The corresponding photoluminescence (PL) spectrum shows sharp phonon-assisted free exciton peaks and minimal signal in the energy range corresponding to carbon-related defects (E = 3.9 – 4.1 eV). Our work demonstrates the viability of growing h-BN by the TSFZ technique, thereby opening a new route towards larger, high-quality crystals and advancing the state of h-BN related research.
Source: Journal of Crystal Growth
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: hybrid
Estimated APC paid: $3,110
Awards: G1271453041, G2842134935, G3475046565, G3630080949, Puzzling out h-BN optics by combining high space, energy and momentum resolution spectroscopies, Enabling Quantum Leap: Q-AMASE-i: Quantum Foundry at UCSB, MIP: Platform for the Accelerated Realization, Analysis, and Discovery of Interface Materials (PARADIM), G8501075933, One dimensional Van der Waals HETEROstructures
OpenAlex ID: W4409198952
