Research Progress on Preparation, Microstructure, Properties, and Optimization of Ta and Its Compounds’ Coatings
Year: 2025
Type: article
Abstract: Tantalum (Ta), along with its compounds and alloys, is extensively applied in the chemical, electronic, biological, and aerospace industries due to its excellent ductility, thermodynamic stability, and corrosion resistance. In recent years, coatings of Ta and its composites, fabricated using methods such as magnetron sputtering (MS), chemical vapor deposition (CVD), electrospark deposition (ESD), and cold spraying (CS), have undergone significant performance enhancements through extensive research efforts. This paper provides a comprehensive overview of the preparation techniques, applications, and improvement techniques associated with Ta and its compounds’ coatings. The preparation process parameters, mechanical properties, and corrosion resistance of Ta alloy coating and Ta non-metallic compound coating are discussed in detail. The findings aim to contribute to the design and development of innovative Ta and its compounds’ coating systems or the refinement of existing systems.
Source: Metals
DOI: 10.3390/met15040416
Authors: Zijun Wang, Guanglin Zhu, Ke Lv, Jie Li, Xinfeng Yu, Yonghao Yu, Cean Guo, Jian Zhang
Institutions: Shenyang Ligong University, North University of China
Language: English
Subfield: Mechanical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: gold
Estimated APC paid: $3,137
Funder: Shenyang Ligong University
OpenAlex ID: W4409218790
