Work

Fabrication of 1000-Line/mm orthogonal grating for Micro-Deformation field mapping

Year: 2025

Type: article

Abstract: High-frequency gratings are vital for microscale deformation field analysis but face fabrication challenges due to cost and complexity. In this study, we innovatively report a rapid fabrication technique of large-area 1000-line/mm (1 µm pitch) orthogonal grating using maskless lithography with a 405 nm UV light source, and apply it to characterize the microscale slip plastic deformation fields of a Nickel-Based Single Crystal superalloy (NBSC) specimen for the first time. Detailed fabrication parameters and quality assessments were outlined. Moreover, in-situ tensile experiments on NBSC speciemen in the [001] tensile direction were performed, and the evolution of the microscale plastic deformation fields was obtained by the sampling moiré method. The results showed that the proposed technique enables the stable fabrication of 1000-line/mm grating with 300 nm feature linewidth, rates up to 20-30 min per 1 mm². The 1000-line/mm grating enables nano-sensitive deformation resolution for plastic deformation displacement fields on the surface of NBSC speciemen. The proposed technique breaks through the minimum linewidth previously reported by maskless lithography using the 405 nm UV light source, which provides a feasible deformation carrier to support microscale deformation measurement of various materials and structures.

Source: Materials & Design

DOI: 10.1016/j.matdes.2025.113923

Authors: Xinyun Xie, Qinghua Wang, Xiaojun Yan

Institution: Beihang University

Language: English

Topic: Optical measurement and interference techniques

Subfield: Computer Vision and Pattern Recognition

Field: Computer Science

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $3,650

Funders: National Natural Science Foundation of China, Beihang University, National Major Science and Technology Projects of China