Year: 2025
Type: article
Abstract: Coated on Nb‐C103 substrate through the sol–gel and spark plasma sintering process, MoSi2 features either a SiO2 diffusion barrier or SiO2‐10 wt%Yb2O3 barrier. The addition of Yb2O3 significantly enhances the diffusion barrier performance; at 1250 °C, the growth rates of diffusion layers at MoSi2/SiO2 and MoSi2/SiO2–10Yb2O3 coatings are 0.36 and 0.32 μm2 h−1, respectively, significantly lower than the 5.01 μm2 h−1 rate observed for the coating without a barrier. At 1550 °C, the growth rate of diffusion layer of MoSi2/SiO2–10Yb2O3 coating is 21.71 μm2 h−1, which is only 14% of that of MoSi2 coating and 44% of that of MoSi2/SiO2 coating. The diffusion barrier layer gradually flows into the holes generated by mutual diffusion and then fails during that specific high‐temperature experiment. The addition of Yb2O3 is found to stabilize the SiO2 network, increase its viscosity, and effectively retard the diffusion of Si. The life of SiO2–10Yb2O3 diffusion barrier is 1.5 times longer than that of SiO2 diffusion barrier.
Source: Advanced Engineering Materials
Institutions: Guangxi University, Xiamen University of Technology
Language: English
Subfield: Aerospace Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: bronze
Award: G2660484998
OpenAlex ID: W4409262644