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Novel inspection technology for detecting via open using parallel e-beam scanning and graphic design system

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0004425

Authors: Jaewon Hwang, Chihoon Lee, Kyu Lee, Younghun Kwon, Wonjo Woo, Seho Kim, Keunhyuk Yang, Youngwoon Yoon

Institutions: Samsung (South Korea), Samsung Electronics (South Korea)

Language: English

Topic: Integrated Circuits and Semiconductor Failure Analysis

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4409267083

FWCI:

Cites: 4

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Related to: 10