Work

In-Situ Plasma Monitoring Using Multiple Plasma Information in SiO₂ Etch Process

Year: 2025

Type: article

Source: IEEE Transactions on Semiconductor Manufacturing

DOI: 10.1109/tsm.2025.3559301

Authors: Min Ho Kim, Jeong Eun Jeon, Sang Jeen Hong

Institution: Myongji University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Research Council of Science and Technology, Korea Evaluation Institute of Industrial Technology

Awards: G374482234, G75951965

OpenAlex ID: W4409310520

FWCI: 0.231

Cites: 40

Cited by: 1

Related to: 10