Work

Epitaxy of high-quality antiferromagnetic metal chromium nitride films with 90° and 40° off-axis magnetron sputtering

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0004445

Authors: Zhiliang Xu, Rongjing Zhai, Jiachang Bi, Ruyi Zhang, Chuyi Ning, Zhangyuan Guo, Yanwei Cao

Institutions: Ningbo University, Chinese Academy of Sciences, Ningbo Institute of Industrial Technology, University of Chinese Academy of Sciences

Language: English

Topic: Magnetic properties of thin films

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funder: National Key Research and Development Program of China

Awards: G7226018011, G8398589713

OpenAlex ID: W4409364926

FWCI:

Cites: 68

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Related to: 10