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Perfectly Spatial and Shape-Controllable Nanocrack Lithography via Localized Compressive-Shear Stress Coupling

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Year: 2025
Type: article
Source: ACS Applied Materials & Interfaces
DOI: 10.1021/acsami.4c20778
Authors: Xu Tian, Sang-Min Kim, Jae-Young Yoo, Min-Seung Jo, Jun-Bo Yoon, Min-Ho Seo
Institutions: Korea Advanced Institute of Science and Technology, KTH Royal Institute of Technology, Pusan National University, Sungkyunkwan University, Northwestern University
Language: English

Topic: Nanofabrication and Lithography Techniques
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
SDG: Industry, innovation and infrastructure

Open Access status: closed

Funder: National Research Foundation of Korea
Awards: G1311411192, G2235668619, G3182502753, G388386966
OpenAlex ID: W4409407012
FWCI:
Cites: 58
Cited by:
Related to: 10
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