Work

Experimental approach for laser direct imaging of negative tone polyimide resists in semiconductor industry

Year: 2025

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.24.2.023801

Authors: Michael Sternad, Philipp Horn, Joerg Ortner, Walter Weber, Andreas Behrendt, Jonas Burghoff, Peter Santner, Sigrid Wabnig

Institutions: Infineon Technologies (Austria), TU Wien

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409414481

FWCI:

Cites: 16

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Related to: 10