Work

Effects of Surface Plasmon and Catalytic Reactions on Capacitance in Metal–Semiconductor Schottky Diodes

Year: 2025

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/acsami.4c23042

Authors: Mincheol Kang, Jihae Choi, Yujin Roh, Hyeonjin Bae, Jeong Young Park

Institution: Korea Advanced Institute of Science and Technology

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Trade, Industry and Energy, National Research Foundation of Korea

Awards: G1857922940, G3678570327, G5617027169

OpenAlex ID: W4409416195

FWCI: 1.156

Cites: 50

Cited by: 3

Related to: 10