Work

Evaluation of the Step Flow Etching Rate Model Based on Atomic Clusters of Monocrystalline Silicon

Year: 2025

Type: article

Source: ECS Journal of Solid State Science and Technology

DOI: 10.1149/2162-8777/adcc51

Authors: Guorong Wu, Xiaoyu Feng, Xiaoya Shi, Meihuan Wang, Min Liang, Chong Chen, Hechong Sun

Institutions: Taizhou University, Taizhou University

Language: English

Topic: Advanced MEMS and NEMS Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Science and Technology Plan Project of Taizhou

OpenAlex ID: W4409423452

FWCI:

Cites: 22

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Related to: 10