Work

Eliminating Nucleation Delay for Atomic Layer-Deposited Low-Defect Dense Multi-Component Thin Films through Preoccupation of Interstitial Sites

Year: 2025

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/acsami.4c22420

Authors: Guoping Su, Haoyan Chen, Honglong Ning, Xiao Fu, Muyun Li, Yuexin Yang, Zhihao Liang, Rihui Yao, Junbiao Peng

Institutions: State Key Laboratory of Luminescent Materials and Devices, South China University of Technology

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Natural Science Foundation of Guangdong Province, Department of Education of Guangdong Province, State Key Laboratory of Luminescent Materials and Devices, National Key Research and Development Program of China, Special Project for Research and Development in Key areas of Guangdong Province

Awards: G1578367231, G3178813082, G4657090741, G4911555718, G5533168714, G6741690439, G7287851366, G7669217038

OpenAlex ID: W4409451000

FWCI: 0.693

Cites: 50

Cited by: 3

Related to: 10