Work

Effect of L-isoleucine on the Removal Rate Selectivity of SiO2/Si3N4 in Chemical Mechanical Polishing of Shallow Trench Isolation

Year: 2025

Type: article

Source: ECS Journal of Solid State Science and Technology

DOI: 10.1149/2162-8777/adcd30

Authors: Shenao Nie, Yuxuan Qiu, Xianghui Li, Xianglong Zhang, Ni Meng, Yanchao Ge, Yongkang Guo, Yangang He

Institution: Hebei University of Technology

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Natural Science Foundation of Hebei Province

OpenAlex ID: W4409452041

FWCI: 0.481

Cites: 44

Cited by: 2

Related to: 10