Comparative Analysis of Charge Plasma Vertical TFET Structures with H f O2 and SiO2 Gate Dielectric materials
Year: 2025
Type: conference-paper
Authors: B. Krishna Bharathi, N. Ramanjaneyulu
Institution: Jawaharlal Nehru Technological University Anantapur
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409495710