Cu dopants as electron buffers for stabilizing Ru-based active layers for hydrogen evolution
Year: 2025
Type: article
Source: Journal of Materials Chemistry A
DOI: 10.1039/d4ta08082c
Authors: Xinyu Wang, Tongtong Liu, Jingjing Wang, Bowen Xia, Yanfei Wang, Zhilin Li, Zhengping Zhang, Feng Wang
Language: English
Field: Energy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409507377
