Enhanced Damage Resistance of Mo/Si Multilayer Mirror with Carbon Barrier Layers under Intense Nanosecond EUV Irradiation
Year: 2025
Type: article
Source: Nano Letters
Authors: Chao Yun, Shuhui Li, Yinzhuo Hu, Xiangyue Liu, Zhanglin Hu, Danqiao Xu, Zhe Zhang, Qiushi Huang, Wenbin Li, Zhanshan Wang
Institution: Tongji University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Award: G1752418903
OpenAlex ID: W4409523050