Work

Systematic Study of Nickel Silicide Based on Wafer-Scale Electrical Testing in 12-in 55 nm CMOS Technology

Year: 2025

Type: article

Source: IEEE Transactions on Electron Devices

DOI: 10.1109/ted.2025.3556407

Authors: Weitong Zhang, Jianghong Wang, Yang Xu, Wenzhang Fang, Ran Tao, Xiaohui Yu, Yishu Zhang, Zhiyuan Cheng, Yunyan Zhang

Institution: Zhejiang University

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Heilongjiang University of Science and Technology

Awards: G3466606746, G3691656933, G8661992291

OpenAlex ID: W4409561310

FWCI:

Cites: 50

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Related to: 10