Work

Unintended Soft Breakdown Mechanism Limiting Ultrathin Ferroelectric HZO Films Scaling

Year: 2025

Type: article

Source: ACS Applied Electronic Materials

DOI: 10.1021/acsaelm.5c00289

Authors: Wonwoo Kho, Hyunjoo Hwang, Hyo-Bae Kim, Gunho Kim, Ji-Hoon Ahn, Seung-Eon Ahn

Institutions: Tech University of Korea, Hanyang University

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Research Foundation of Korea

Award: G7792612290

OpenAlex ID: W4409569608

FWCI: 1.36

Cites: 47

Cited by: 6

Related to: 10