Work

High Pressure Resistance in Omniphobic Distillation Membranes with Re-entrant Nanostructures

Year: 2025

Type: article

Source: Nano Letters

DOI: 10.1021/acs.nanolett.5c01604

Authors: Sangsuk Lee, Omar A. Laris, Elizabeth A. Hjelvik, Eric M. V. Hoek, Anthony P. Straub

Institutions: University of Colorado Boulder, Lawrence Berkeley National Laboratory, University of California, Los Angeles

Language: English

Topic: Surface Modification and Superhydrophobicity

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: Bureau of Reclamation, University of Colorado Boulder, Division of Chemical, Bioengineering, Environmental, and Transport Systems, Division of Industrial Innovation and Partnerships, National Science Foundation Graduate Research Fellowship Program

Awards: G3453059155, G5498873481, G628600038, G6561715094

OpenAlex ID: W4409578145

FWCI: 1.042

Cites: 41

Cited by: 5

Related to: 10