Work

Er 3+ ‐doped amorphous tellurite thin films

Year: 2025
Type: article
Abstract: Radio‐frequency (RF) magnetron sputtering was used to deposit amorphous tellurite thin films from glassy targets from TeO 2 –ZnO–Na 2 O/BaO/Bi 2 O 3 system doped with 2.5 mol% of Er 2 O 3 . The impact of the sputtering power on the optical, luminescence, and structural properties of the films is discussed. The deposition process leads to amorphous and transparent films which emit light in the visible and near‐infrared confirming the presence of Er 3+ in the films’ network. Owing to their large refractive index and stability overtime, the Bi containing films are potential materials for integrated photonics and optical switches.
Language: English
Open Access status: hybrid
Estimated APC paid: $4,070
OpenAlex ID: W4409579243
FWCI: 0.957
Cites: 55
Cited by: 3
Related to: 10