Work

High-Performance Oxide Thin-Film Transistors with Atomic Layer Deposition-Grown HfO 2 /BeO Hetero-Dielectric

Year: 2025

Type: article

Source: Nano Letters

DOI: 10.1021/acs.nanolett.5c00552

Authors: Sein Lee, Yoonseo Jang, Wooho Ham, Jonghyun Bae, Kyunghwan Kim, Jeong-Min Park, Junseo Lee, Min-Kyu Song, Dohwan Jung, Prakash R. Sultane, Jae-Hoon Han, Christopher W. Bielawski, Jungwoo Oh, Jang-Yeon Kwon

Institutions: Yonsei University, Korean Association Of Science and Technology Studies, Korea Institute of Science and Technology, Korea University, Massachusetts Institute of Technology, Institute for Basic Science, Ulsan National Institute of Science and Technology

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Research Foundation of Korea, Institute for Basic Science

Awards: G1065324744, G767668997

OpenAlex ID: W4409618038

FWCI: 1.803

Cites: 51

Cited by: 8

Related to: 10