Work

Projection version of quantum optical lithography with type I diffracted photons

Year: 2025

Type: article

Abstract: The suppression of wave-particle duality in multiple slit experiments has indicated the presence of Type I diffracted photons with particle behavior. The breakdown of the diffraction limit is possible with Type I diffracted photons and it will be applied in optical lithography. In this paper, we present results regarding a diffractionless optical lithography, Projection Quantum Optical Lithography (Projection QOL), with different NA projection lens and resolution of ~ 14 nm. A potential application for the realization of 1 nm complex patterns is analyzed. Projection QOL could sustain R&D efforts of semiconductor chip industry.

Source: Applied Optics

DOI: 10.1364/ao.559721

Authors: E. Pavel, A. Dinescu, D. Mladenovic, O. Brincoveanu

Institution: National Institute for Research and Development in Microtechnologies

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: gold

Funder: Ministerul Cercetării, Inovării şi Digitalizării

Awards: G147834814, G2728914447