Work

LLM-based overlay issue classification and solution optimization in semiconductor manufacturing

Year: 2025

Type: conference-paper

DOI: 10.1117/12.3050976

Author: Tae Kwon Jee

Language: English

Topic: Industrial Vision Systems and Defect Detection

Subfield: Industrial and Manufacturing Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4409655045

FWCI:

Cites: 4

Cited by:

Related to: 10