The exploration of curvilinear mask manufacturability and wafer printability
Year: 2025
Type: conference-paper
DOI: 10.1117/12.3050611
Authors: Sheng Tse Chen, Kevin Lu, Gloria Yeh, Chun-Cheng Liao, Mohamed Ramadan, Christopher J. Progler, Henry Kamberian, Jinju Beineke, Michael Green, Guangming Xiao, Kyle Braam, John Tsai, John Valdez, John M. Burns, Alex Zepka, Elsley Tan, Linghui Wu, Yu-Po Tang
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4409655046
