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The exploration of curvilinear mask manufacturability and wafer printability

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Year: 2025
Type: conference-paper
DOI: 10.1117/12.3050611
Authors: Sheng Tse Chen, Kevin Lu, Gloria Yeh, Chun-Cheng Liao, Mohamed Ramadan, Christopher J. Progler, Henry Kamberian, Jinju Beineke, Michael Green, Guangming Xiao, Kyle Braam, John Tsai, John Valdez, John M. Burns, Alex Zepka, Elsley Tan, Linghui Wu, Yu-Po Tang
Institutions: Nanya Technology (Taiwan), Photronics (United States), Synopsys (United States)
Language: English

Topic: Advancements in Photolithography Techniques
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences

Open Access status: closed
OpenAlex ID: W4409655046
FWCI:
Cites: 6
Cited by:
Related to: 10
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